High Energy Excimer Laser Mirrors
- Excimer Laser Mirrors, ArF(193nm)
- Excimer Laser Mirrors, KrF(248nm)
- Excimer Laser Mirrors, XeCl(308nm)
- Excimer Laser Mirrors, XeF(351-353nm)
- High Energy Excimer / He-Ne Laser Mirrors
High Energy Excimer Laser Mirrors ArF(193nm) / KrF(248nm)
Specifications:
- Substrate material: BK7
- S1 Surface Figure: λ/10 @ 633nm
- S1 Surface Quality: 10-5 laser quality
- S2 Surface Quality: Commercial Polish
- Diameter Tolerance: ±0.0/-0.20mm
- Thickness Tolerance: ±0.25mm
- Min. Reflectance: ArF ≥ 97.0%
KrF ≥ 99.0% - Clear Aperture: > 85% of diameter
- Chamfer: 0.3mm at 45 typical
- Damage Threshold: 1 J/cm210ns pulse
- Adhesion Threshold: Per MIL-C-675A
High Energy Excimer Laser Mirrors XeCl(308nm) / XeF(351-353nm)
Specifications:
- Substrate material: UV fused Silica or BK7
- S1 Surface Figure: λ/10 @ 633nm
- S1 Surface Quality: 10-5 laser quality
- S2 Surface Quality: Commercial Polish
- Diameter Tolerance: ±0.0/-0.20mm
- Thickness Tolerance: ± 0.25mm
- Min. Reflectance: XeCl ≥ 97.0%
XeF ≥ 99.0% - Clear Aperture: > 85% of diameter
- Chamfer: 0.3mm at 45 typical
- Damage Threshold: 1 J/cm210ns pulse
- Adhesion Threshold: Per MIL-C-675A
High Energy Excimer / He-Ne Laser Mirrors
Specifications:
- Substrate material: UV fused silica
- S1 Surface Figure: λ/10 @ 633nm
- S1 Surface Quality: 10-5 laser quality
- Diameter Tolerance: +0.0/-0.20mm
- Thickness Tolerance: ± 0.25mm
- Wedge: < 3 arc min.
- Clear Aperture: > 85% of diameter
- Chamfer: 0.3mm at 45 typical
- Adhesion Threshold: Per MIL-C-675A
