Laser Mirrors

High Energy Excimer Laser Mirrors ArF(193nm) / KrF(248nm) . SPECIFICATIONS   Substrate material:     BK7   Min. Reflectance:           ArF 97.0% S1 Surface Figure:      /10 @ 633nm                                   KrF 99.0% S1 Surface Quality:    10-5 laser quality Clear Aperture:              > 85% of diameter S2 Surface Quality:    Commercial Polish Chamfer:                      0.3mm at 45 typical Diameter Tolerance:   Â± 0.0/-0.20mm Damage Threshold:         1 J/, 10ns pulse Thickness Tolerance:  Â± 0.25 mm Adhesion and Durability:   Per MIL-C-675A   High Energy Excimer Laser Mirrors XeCl(308nm) / XeF(351-353nm) . SPECIFICATIONS   Substrate material:  UV fused Silica or BK7   Min. Reflectance:           XeCl 97.0% S1 Surface Figure:      /10 @ 633nm                                    XeF 99.0% S1 Surface Quality:    10-5 laser quality Clear Aperture:              > 85% of diameter S2 Surface Quality:    Commercial Polish Chamfer:                      0.3mm at 45 typical Diameter Tolerance:   Â± 0.0/-0.20mm Damage Threshold:         1 J/, 10ns pulse Thickness Tolerance:  Â± 0.25 mm Adhesion and Durability:   Per MIL-C-675A